Intellectual Property Law
Ranked #12 in the Country by 'U.S. News & World Report' (2023 rankings)
Founded more than 25 years ago, Chicago-Kent's Intellectual Property Law Program is one of the strongest in the country, reflecting and anticipating the ever-changing nature and challenges of the contemporary IP field. Our faculty are not only nationally recognized as leaders in the field, but dedicated to student mentorship. Chicago-Kent students benefit from the college’s extensive alumni network, many of whom work in IP firms and corporate law departments throughout the Chicago area and around the country.
At Chicago-Kent students have the opportunity to explore countless IP events and activities, participate in multiple student groups, try out for our nationally recognized moot court team, submit to IP-oriented writing competitions, or participate in major IP events such as the annual Supreme Court Intellectual Property Review conference, and the Chicago Intellectual Property Colloquium. We offer advanced training in patent law, offering both practical experience and specialized coursework for those interested in this complex field. Additionally, students can have their work published in the highly-regarded, student-run Chicago-Kent Journal of Intellectual Property.
Degrees and Certifications
Chicago-Kent offers several paths of study for those who have an interest in intellectual property law.
Centers and Journals
Chicago-Kent houses multiple academic centers as well as a journal dedicated to intellectual property law.
Chicago-Kent has not one, but several student organizations dedicated or related to intellectual property law. Students support each others' scholarly interests, compete in moot court competitions, and even put on their own IP events.
Several times a year, Chicago-Kent’s Intellectual Property program hosts or participates in major annual events that keep students, alumni, and faculty up to date on current issues related to IP law and allow them to network and converse with other leaders in the field.